Contact
How to shop
Delivery
Shopping guide
Defects and Diffusion in Silicon Processing: Volume 469
English
63 b
Coming soon
Date unknown
Up to 30 days for returns
Customers also purchased
/
Paperback
25.00
€
A strong effort is has been devoted to the investigation of defects and diffusion phenomena in silicon. This effort is not only driven by the stringent technological requirements for the processing of integrated circuits of increased complexity and miniaturization, but also by the lack of fundamental understanding of many of the critical parameters and mechanisms involved. Experimental and theoretical investigations are needed to identify the properties of the defects, the mechanisms of impurity diffusion and the strength of impurity-defect, defect-defect, and impurity-impurity interactions. This book provides a unique and interdisciplinary forum for the discussion of experimental, theoretical and applied aspects of defects and diffusion phenomena in silicon. Topics include: defect properties and diffusion phenomena in silicon; experimental and theoretical assessments of defect properties; transient-enhanced diffusion and dopant clustering; damage evolution and extended defects and gettering procedures.
About the book
English
Give this book today
It's easy
1 Add to cart and choose Deliver as present at the checkout 2 We'll send you a voucher 3 The book will arrive at the recipient's addressYou might also be interested in
/
Paperback
20.16
€
/
Paperback
9.37
€
/
Paperback
18.45
€
/
Paperback
15.73
€
Hi! I'm Libroamiko, your book advisor.
How can I help you?